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Microstructural Evolution of Charged Defects in the Fatigue Process of Polycrystalline BiFeO3 Thin Films

机译:疲劳过程中带电缺陷的微观结构演变   多晶BiFeO3薄膜

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摘要

Fatigue failure in ferroelectrics has been intensively investigated in thepast few decades. Most of the mechanisms discussed for ferroelectric fatiguehave been built on the "hypothesis of variation in charged defects", whichhowever are rarely evidenced by experimental observation. Here, using acombination of complex impedance spectra techniques, piezoresponse forcemicroscopy and first-principles theory, we examine the microscopic evolutionand redistribution of charged defects during the electrical cycling in BiFeO3thin films. The dynamic formation and melting behaviors of oxygen vacancy (VO)order are identified during the fatigue process. It reveals that the isolatedVO tend to self-order along grain boundaries to form a planar-alignedstructure, which blocks the domain reversals. Upon further electrical cycling,migration of VO within vacancy clusters is accommodated with a lower energybarrier (~0.2 eV) and facilitates the formation of nearby-electrode layerincorporated with highly concentrated VO. The interplay between the macroscopicfatigue and microscopic evolution of charged defects clearly demonstrates therole of ordered VO cluster in the fatigue failure of BiFeO3 thin films.
机译:在过去的几十年中,对铁电材料的疲劳失效进行了深入的研究。讨论的大多数铁电疲劳机理都建立在“带电缺陷变化假说”的基础上,但是很少能通过实验观察得到证明。在这里,我们结合使用了复杂的阻抗谱技术,压电响应力显微镜和第一性原理,研究了BiFeO3薄膜在电循环过程中带电缺陷的微观演化和重新分布。在疲劳过程中确定了氧空位(VO)有序的动态形成和熔化行为。结果表明,孤立的VO趋于沿着晶界自定序,形成平面排列的结构,从而阻止了畴的反转。经过进一步的电循环后,空位簇中的VO迁移以较低的能垒(〜0.2 eV)得以适应,并促进了结合有高浓度VO的附近电极层的形成。带电缺陷的宏观疲劳和微观演变之间的相互作用清楚地证明了BiFeO3薄膜疲劳失效中有序VO团簇的作用。

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